Industrial 2D imager 2MP LQL-9 LT-DPM ESYF Datalogic 937600060
3.696,55 € 3.326,90 € incl. VAT
Datalogic Matrix 300N 937600060 – 2MP LQL-9 LT-DPM ESYF industrial 2D imager, optimized for reading low-contrast DPM codes, ESYF protection for ultra-sensitive electronic environments.
Datalogic Matrix 300N 937600060 – Industrial 2D Imager 2MP LQL-9 LT-DPM ESYF
Datalogic Matrix 300N 937600060 is a state-of-the-art 2D industrial imager, equipped with 2MP sensor and LQL-9 LT-DPM (Low Tone Direct Part Marking) optics. It is designed for reading shallowly engraved or low-contrast DPM codes on metal, plastic or other industrial materials.
The model includes ESYF (ElectroStatic Yield Friendly) protection, which makes it the ideal choice for the electronics industry and ultra-sensitive applications, where it is necessary to eliminate the risk of electrostatic discharges. With specialized lighting and rugged construction, it delivers reliable performance in critical applications.
Key Features – Datalogic Matrix 300N 937600060
- 📷 2MP Sensor – high resolution for complex codes
- 🔍 LT-DPM Optics – optimized for shallowly engraved codes
- ⚡ ESYF Protection – safe for ultra-sensitive electronic environments
- 💡 Dedicated Lighting – superior visibility for low contrast
- 🌐 Full Connectivity – Ethernet, USB, Serial
- 🛡️ Robust design – IP protection for harsh industrial environments
- 🏭 Applications – electronics, automotive, aerospace, OEM
Technical specifications – Datalogic Matrix 300N 937600060
| Feature | Details |
|---|---|
| Model | MATRIX 300N 472-012 |
| Product Code | 937600060 |
| Resolution | 2 MP |
| Optics | LQL-9 LT-DPM ESYF |
| Additional Protection | ESYF (ElectroStatic Yield Friendly) |
| Interfaces | Ethernet, USB, Serial |
| Functionality | Reading shallowly etched DPM codes with low contrast |
| Applications | Electronics, automotive, aerospace, OEM |
👉 Datalogic Matrix 300N 937600060 is the perfect solution for reading low-contrast DPM codes, ensuring ESYF protection in electronic applications and ultra-sensitive environments.
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